This event is sponsored by Applied Materials-NUS Advanced Materials Corporate Lab.
Description and target audience – This full-day course, open to the public, provides an introduction to Atomic Layer Deposition (ALD) as a key atomic-scale processing method. Topics will range from ALD fundamentals, processes, and applications to equipment, precursors, and process development. Variants such as plasma-enhanced ALD (PEALD) will also be covered, along with critical concepts like uniformity and conformality, and related atomic-scale techniques such as Atomic Layer Etching (ALE) and Area-Selective Deposition (ASD).
Following the public session, a half-day closed event—exclusive to members of the NUS Advanced Materials Corporate Lab—will provide a deeper dive into hardware effects, material and process characterization, surface chemistry, and film nucleation.
This course is designed for newcomers, as well as engineers, scientists, and professionals seeking a stronger foundation in ALD and related atomic-scale processing techniques.
Instructors – The course will be given by:
- Prof. Gregory Parsons – North Carolina State University, U.S.A.
- Prof. Erwin Kessels – Eindhoven University of Technology, Netherlands
Course material – The course material will be provided during the course. Some course material can already be downloaded here: (password-protected)
Program – The program runs from noon-to-noon on March 4 and 5. On March 5, there is a closed session for Applied Materials Corporate Labs employees. On the evening of March 4 there is a mixer.
The preliminary program schedule is:
Tuesday March 4 – afternoon
| 1:15 | 1:30 | Welcome |
| 1:30 | 3:15 | Thin-film technologies and atomic-scale processing ALD basics, processes and applications |
| 3:15 | 3:45 | Afternoon break |
| 3:45 | 5:30 | ALD reactors and precursors ALD process development |
| 5:30 | Mixer |
Wednesday March 5 – morning
| 9:00 | 10:45 | Plasma-enhanced ALD Conformality and uniformity |
| 10:45 | 11:15 | Morning break |
| 11:15 | 1:00 | Area-selective deposition Atomic layer etching |
Wednesday March 5 – afternoon
(Closed event, exclusive to corporate lab members)
| 2:30 | 3:45 | Hardware effects Material and process characterization |
| 3:45 | 4:15 | Afternoon break |
| 4:15 | 5:30 | Surface chemistry Film nucleation effects |
Venue – National University of Singapore – exact location to be announced.
Registration – To be announced. If interested, please send an email to info@ALDacademy.com