On April 3, 2019 an ALD Academy course took place on nucleation and area-selective deposition. This was the day before the 4th Area Selective Deposition workshop (ASD2019) which took place in Leuven, Belgium.
Responses to the course:
Students Professionals(<5 years) Professionals(>5 years) Postdocs12 57.1% 5 23.8% 3 14.3% 1 4.8%
4.7 out of 5.0 stars The course was well presented by the speakers
4.5 out of 5.0 stars The course met my expectations
3.9 out of 5.0 stars The course provided useful skills
4.6 out of 5.0 stars The course was well setup
4.5 out of 5.0 starsI would recommend the course to others
A few quotes:
“Everything relevant was covered!”
“Everything went smoothly and the food was good”
“ALE is becoming a hot topic, please include that topic next time”
“Would be interesting to have also more specific industry requirements on selectivity”
Area-selective deposition (ASD) has recently developed into an active field of research in both academia and industry, triggered by the fact that alignment is becoming a bottleneck in semiconductor fabrication. Especially area-selective atomic layer deposition (ALD) is acquiring attention for implementation in self-aligned fabrication schemes. This development builds on earlier successes in the fields of selective epitaxy and area-selective chemical vapor deposition (CVD). Besides nanoelectronics, ASD is expected to enable bottom-up fabrication in catalysis, energy generation and storage.
Description – This course is an introduction to area-selective deposition (ASD), and addresses fundamental aspects related to initial growth, nucleation mechanisms and selectivity. The current interest in ASD will be put in perspective by providing an introduction to nanopatterning and an overview of the applications of ASD. There will be a focus on area-selective atomic layer deposition (ALD), but also results from the field of selective epitaxy and area-selective CVD will be discussed. Furthermore, an overview of the approaches for area-selective ALD will be presented. The course will have an interactive atmosphere with plenty of time for questions and discussions. During this course, the attendees will acquire understanding of the basics of ASD and learn why ASD has become a hot topic in semiconductor fabrication in recent years.
This ALD Academy takes place on April 3 at Eindhoven University of Technology, the day before the 4th Area Selective Deposition workshop (ASD2019) in Leuven, Belgium.
Target audience – This ALD Academy is aimed at students, researchers, and engineers that are interested or work in the field of ASD, or work on related technologies such as patterning, deposition or etching. It can serve as an introduction for the ASD2019 workshop, which is targeted to a more experienced audience.
Program – The program comprises 6 lectures and runs from 9:00 to 17:00. The speakers are Gregory Parsons, Adrie Mackus and Erwin Kessels.
Morning session
Welcome and introduction to the ALD Academy
- Nanopatterning
- Introduction to area-selective deposition
- Applications of area-selective deposition
Afternoon session
- Nucleation mechanisms
- Approaches to area-selective atomic layer deposition
- Models for nucleation and ASD
Wrap up and closing
Drinks & snacks