Date – 25th of May 2023
Description and target audience – A full day course to learn the fundamentals of atomic layer deposition (ALD). The aim is to provide both in-depth mechanistic understanding as well as to provide practical information how to run ALD processes in a laboratory or industrial setting. The target audience are newcomers to the field and engineers/scientists/professionals who want to get a better understanding of the fundamental aspects underlying ALD.
Topics that will be covered include the basics of ALD and its key features (thickness control, conformality, uniformity, low temperature); ALD processes (oxides, nitrides, metals, sulfides, etc.); precursors and co-reactants for ALD; ALD process design; ALD configurations and reactors; hardware effects and ALD practicalities; ALD surface chemistries; nucleation effects and initial growth, etc.
Instructors – The course will be given by:
- Prof. Gregory Parsons – North Carolina State University, U.S.A.
- Prof. Séan Barry – Carleton University, Canada
- Prof. Erwin Kessels – Eindhoven University of Technology, Netherlands
Course material – The course material will be provided during the course. Some course material will be made available for download here (password-protected)
Program – The program runs from 9:00 to 17:00 consists of 7 sessions. The day ends with drinks. A tour to the NanoLab@TU/e clean room and other ALD labs is optional.
The preliminary program schedule is:
| 09:00 | 09:15 | Welcome and opening |
| 09:15 | 10:00 | Introduction to ALD and its key features |
| 10:00 | 10:45 | ALD processes and applications |
| 10:45 | 11:15 | Morning break |
| 11:15 | 12:00 | Precursors and co-reactants for ALD |
| 12:00 | 13:30 | Lunch break |
| 13:30 | 14:15 | ALD reactors and hardware effects |
| 14:15 | 15:00 | ALD surface chemistry |
| 15:00 | 15:30 | Afternoon break |
| 15:30 | 16:15 | Uniformity and conformality of ALD |
| 16:15 | 17:00 | Nucleation and initial growth during ALD |
| 17:00 | 18:00 | Drinks (optional: lab tour) |
Venue – The courses will take place at the campus of the Eindhoven University of Technology in the theater hall of the Grand Café De Zwarte Doos (https://www.dezwartedoos.nl/homeeng, here you can also find the directions).
Registration – Registration includes participation in the course, a digital copy of the course notes, coffee/tea and sandwich lunches. Registration closes May 16, 2023.
Note: We have a few places left for last-minute registration! You can still register until Tuesday May 23rd.
The registration fee depends on whether participants are from academia or industry:
- From industry: €500
- From academia: €250
- BSc/MSc/PhD students: €125
Registration is a two-step process:
Fill in the online form below.
Transfer the registration fee (free of possible bank charges) to the following bank account while providing the information:
– name(s) of the participant(s)
– organization/company
Bank account information:
IBAN: NL05INGB0003771290
BIC: INGBNL2A
Account owner: Stichting tot Bevordering van de Plasmachemie
City: Nijmegen, The Netherlands
Registration is only complete when both steps have been taken. At that stage, the successful registration will be confirmed.